Pattern formation method using a photo mask for manufacturing a semiconductor device (Q120642345)
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US patent 11294286
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Pattern formation method using a photo mask for manufacturing a semiconductor device |
US patent 11294286 |
Statements
Pattern formation method using a photo mask for manufacturing a semiconductor device (English)
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Ru-Gun Liu (Hsinchu County)
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Chin-Hsiang Lin (Hsinchu)
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Cheng-I Huang (Hsinchu)
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Chih-Ming Lai (Hsinchu)
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Chien-Wen Lai (Hsinchu)
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Ken-Hsien Hsieh (Taipei)
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Shih-Ming Chang (Hsinchu)
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Yuan-Te Hou (Hsinchu)
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