Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor device (Q122781437)

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US patent 11489077
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Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor device
US patent 11489077

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    Method for forming oxide semiconductor film, semiconductor device, and method for manufacturing semiconductor device (English)
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    Shunpei Yamazaki (Setagaya)
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    Masahiro Watanabe (Tochigi)
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    Mitsuo Mashiyama (Oyama)
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    Kenichi Okazaki (Tochigi)
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    Motoki Nakashima (Atsugi)
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    Hideyuki Kishida (Isehara)
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    24 August 2020
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    1 November 2022
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