Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art. (Q37536693)
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scientific article published on July 2009
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art. |
scientific article published on July 2009 |
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Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art. (English)
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A E Grigorescu
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C W Hagen
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Identifiers
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