Micropatterning of poly(dimethylsiloxane) using a photoresist lift-off technique for selective electrical insulation of microelectrode arrays. (Q41763600)
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scientific article published on May 2009
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Micropatterning of poly(dimethylsiloxane) using a photoresist lift-off technique for selective electrical insulation of microelectrode arrays. |
scientific article published on May 2009 |
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Micropatterning of poly(dimethylsiloxane) using a photoresist lift-off technique for selective electrical insulation of microelectrode arrays (English)