Lithography application of a novel photoresist for patterning of cells (Q44740957)
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scientific article published in May 2004
Language | Label | Description | Also known as |
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English | Lithography application of a novel photoresist for patterning of cells |
scientific article published in May 2004 |
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Lithography application of a novel photoresist for patterning of cells (English)
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Wei He
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Craig R Halberstadt
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Kenneth E Gonsalves
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1 May 2004
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25
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11
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2055-2063
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Identifiers
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