Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition (Q46581840)
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scientific article published in July 2005
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English | Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition |
scientific article published in July 2005 |
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Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition (English)
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Diana Boos
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1 July 2005
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44
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30
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4707-4712
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