Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition (Q46581840)

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scientific article published in July 2005
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Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition
scientific article published in July 2005

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    Surface modification with orthogonal photosensitive silanes for sequential chemical lithography and site-selective particle deposition (English)

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