Plasma‐enhanced chemical vapor deposited silicon carbide as an implantable dielectric coating (Q48147659)
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scientific article published on December 1, 2003
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Plasma‐enhanced chemical vapor deposited silicon carbide as an implantable dielectric coating |
scientific article published on December 1, 2003 |
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Plasma‐enhanced chemical vapor deposited silicon carbide as an implantable dielectric coating (English)
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Plasma-enhanced chemical vapor deposited silicon carbide as an implantable dielectric coating (English)
Ying Ping Liu
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Robyn Edell
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Stuart F. Cogan
David J. Edell
1 December 2003
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