Influence of discharge power level on the properties of hydroxyapatite films deposited on Ti6A14V with RF magnetron sputtering (Q49165508)
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scientific article published in February 1995
Language | Label | Description | Also known as |
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English | Influence of discharge power level on the properties of hydroxyapatite films deposited on Ti6A14V with RF magnetron sputtering |
scientific article published in February 1995 |
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Influence of discharge power level on the properties of hydroxyapatite films deposited on Ti6A14V with RF magnetron sputtering (English)
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van Dijk K
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Schaeken HG
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Wolke JC
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Marée CH
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Habraken FH
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Verhoeven J
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Jansen JA
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1 February 1995
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29
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2
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269-276
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