Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries. (Q50901899)
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scientific article published in October 2007
| Language | Label | Description | Also known as |
|---|---|---|---|
| English | Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries. |
scientific article published in October 2007 |
Statements
Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries. (English)
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Paul F Nealey
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Juan J de Pablo
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Mark P Stoykovich
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Huiman Kang
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Kostas Ch Daoulas
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Guoliang Liu
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Chi-Chun Liu
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1 October 2007
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3
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168-175
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Identifiers
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