Photoelectrochemical Behavior of n-type Si(100) Electrodes Coated with Thin Films of Manganese Oxide Grown by Atomic Layer Deposition (Q57448282)

From Wikidata
Jump to navigation Jump to search
No description defined
edit
Language Label Description Also known as
English
Photoelectrochemical Behavior of n-type Si(100) Electrodes Coated with Thin Films of Manganese Oxide Grown by Atomic Layer Deposition
No description defined

    Statements

    Photoelectrochemical Behavior of n-type Si(100) Electrodes Coated with Thin Films of Manganese Oxide Grown by Atomic Layer Deposition (English)
    0 references
    0 references
    Nicholas C. Strandwitz
    0 references
    David J. Comstock
    0 references
    Ronald L. Grimm
    0 references
    Adam C. Nichols-Nielander
    0 references
    Jeffrey Elam
    0 references
    March 2013
    0 references
    117
    0 references
    10
    0 references
    4931-4936
    0 references

    Identifiers

    0 references
     
    edit
      edit
        edit
          edit
            edit
              edit
                edit
                  edit
                    edit