Interface engineering of the photoelectrochemical performance of Ni-oxide-coated n-Si photoanodes by atomic-layer deposition of ultrathin films of cobalt oxide (Q59758974)

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scholarly article by Xinghao Zhou et al published 2015 in Energy and Environmental Science
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Interface engineering of the photoelectrochemical performance of Ni-oxide-coated n-Si photoanodes by atomic-layer deposition of ultrathin films of cobalt oxide
scholarly article by Xinghao Zhou et al published 2015 in Energy and Environmental Science

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    Interface engineering of the photoelectrochemical performance of Ni-oxide-coated n-Si photoanodes by atomic-layer deposition of ultrathin films of cobalt oxide (English)
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    Xinghao Zhou
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    Rui Liu
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    Ke Sun
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    Matthew T. McDowell
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    Fan Yang
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    Stefan T. Omelchenko
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    Fadl H. Saadi
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    Adam C. Nielander
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    Sisir Yalamanchili
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    Kimberly M. Papadantonakis
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    Bruce S. Brunschwig
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    2015
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    8
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    9
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    2644-2649
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